Metal coating PVD Physical vapor deposition technology
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The HÜTTINGER PFG 10000DC is a high-performance DC (direct current) power supply,
which supplies constant current. The specifications are as follows:
Power: 10 kW
Input voltage: 3x400V AC, 50/60Hz
Output voltage: 0-1000V DC
Output current: 0-10A DC
Accuracy: 0.1%
Efficiency: 92%
Protection: overload, short circuit, overvoltage, low voltage
Overall dimensions: 670 x 490 x 200 mm
Weight: 41 kg
The HÜTTINGER PFG 10000DC can be widely used in laboratory and industrial applications,
where a high precision and reliable DC power supply is required.
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PVD generator HÜTTINGER TIG 30 DC specification
• Output voltage: 0-825V
• Maximum output power: 30 kW
• Input voltage: 3 x 400 VAC ±10%, 50/60 Hz
• Output current range: 0-1000 mA (DC)
• Elongation: < 0.5% (peak to peak)
• Stability: < 0.1% (for 8 hours)
• Control interface: RS-232, analog 0-10 V
• Safety features: overvoltage protection, overcurrent protection, temperature monitoring
• Operating temperature: 0-40°C
• Dimensions: 19" rack support, 10U height (440 x 580 x 450 mm)
Please note that these specifications may vary depending on the type and configuration of the HÜTTINGER TIG 30 DC power supply.
Schneider DLAS 41F-0215T17001 power supply
Electrical data: 50/60 Hz 33kVA
Pri.: 400/480 V 49/41 A
Sec.: 255 V 25 A
Sec.: 255 V 25 A
Sec.: 255 V 25 A
Size: 640 mm x 640 mm x 2200 mm (height)
Weight: 516 kg
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The PEIRS Sputtering 120 kW power supply is a high-power voltage conversion device used for thin film deposition by sputtering. Sputtering technology allows for the deposition of ultra-thin layers of various materials, such as metals, insulators, and semiconductors.
The PEIRS 120 kW power supply features the following:
Output power: 120 kW
Input voltage: 480 VAC, 3-phase
Output voltage: 0-1200 VDC
Output current: 0-1000 ADC
Power factor: 0.97
Overall dimensions: 1220 mm x 850 mm x 2300mm (height).
Weight: 1100 kg.
Protection features: short circuit, overload, overvoltage
Modular design, allowing for easy maintenance and flexible expansion.
This power supply operates reliably and efficiently with high-power ion sources used in the sputtering process and large-area target substrates.
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